Low Etch Rate
Model:Low Etch Rate
Metal compound powders with extremely high chemical stability are used as additives (such as barium sulfate (BaSO₄), titanium dioxide (TiO₂), ceramics, etc.).
Scope of application
- Suitable for the wide application of etching machines from brands such as AMAT, LAM, TEL, NAURA, and AMEC.
Advantage
Excellent plasma corrosion resistance
Excellent plasma corrosion resistance
