Technical Innovation
The backbone of R&D and technical personnel mainly comes from those with educational backgrounds from the University of Electronic Science and Technology of China (UESTC), as well as technical application executives from well-known domestic listed companies with production lines. All core members have more than 15 years of experience in plasma equipment application. The team has strong practical operation capabilities, and by relying on the resources and theoretical accumulation of universities and research institutions, it continuously innovates and strives for excellence.
The National Key Laboratory of Electronic Thin Films and Integrated Devices was established in July 2006 with the approval of the Ministry of Science and Technology, based on the former Key Laboratory of Novel Sensors of the Ministry of Education, the Key Laboratory of Electronic Information Materials and Applications of the Ministry of Information Industry, and the Key Laboratory of Power Semiconductor Technology. It passed the acceptance inspection by the Ministry of Science and Technology in October 2008 and was officially put into operation.
Through the strategy of "introducing external talents and cultivating internal talents", the laboratory currently has a high-level research team of 80 members, including 2 academicians, 6 recipients of the National Science Fund for Distinguished Young Scholars, 7 Changjiang Scholars, 17 participants of the "National Overseas High-Level Talent Introduction Program", 2 leaders of the "Ten-Thousand Talents Program", 6 members of the National Hundred, Thousand and Ten Thousand Talents Project, 6 recipients of the National Science Fund for Excellent Young Scholars, 4 Changjiang Young Scholars, 4 recipients of the National High-Level Talents Special Support Program for Young Top Talents, 3 innovative research groups of the National Natural Science Foundation of China, and 1 national defense science and technology innovation team.
After several years of steady development, the company has gathered a high-quality R&D team. It has jointly established the "Plasma Equipment and Application Technology Research Center" with the "National Key Laboratory of Electronic Thin Films and Integrated Devices" of the University of Electronic Science and Technology of China (UESTC). With numerous domestic and foreign patents and core competitiveness, the company continuously promotes technological innovation and product iteration to meet the diversified needs of the market.