Metal Etching Machine
Model:PMTE2000
Floor Space: Length 110mm / Width 2200mm / Height 2000mm
Wafer Loading Size: Standard 8-inch wafers, 6-inch wafers, etc.
Scope of application
- Metal etching in wafer production
- Suitable for processes such as Al-Si-Cu and Ti/TiN
- Metal etching process for standard 8-inch and 6-inch wafers
Main features
Source+Bias RF system design
Can be equipped with multi-chamber transfer platform
High etching rate and excellent uniformity
Wide adjustable range of etching angles